These results demonstrate the high quality of the junction obtained by this controlled undercut technique. The phase qubit coherence times, extracted from spectroscopy resonance width, Rabi and Ramsey oscillations decay and energy relaxation measurements, are longer than the ones obtained in our previous samples realized by standard techniques. Although this high voltage enables a precise control of the undercut, implementation using a conventional 20kV E-beam is also discussed.
We have fabricated Al/AlOx/Al Josephson junctions, phase qubit and capacitors using a 100kV E- beam writer.
The absence of bridges increases the mechanical robustness of the resist mask as well as the accessible range of the junction size, from 0.01 to more than 10000 micron square. Paste the video link or enter a few words in the search box. The design by E-beam lithography of strongly asymmetric undercuts on a bilayer resist enables in-situ fabrication of junctions and capacitors without the use of the well-known suspended bridge. It only takes two steps to download any video with AmoyShare Free Video Downloader. We present a novel shadow evaporation technique for the realization of junctions and capacitors.
0 kommentar(er)
